Best-in-class high efficiency transmission gratings for pulse compression, high power beam combining, remote sensing and spectroscopy applications.
The gratings are fabricated using DUV Projection Photolithography and Reactive Ion Etch in hard dielectrics and high purity Fused Silica substrates.
We also offer custom transmission gratings fabricated to your specifications, including custom wavelength range, line count, size and performance levels.
Common Specifications for Transmission Gratings for Pulse Compression, Beam Combining and Spectroscopy.
Substrate Width and Height Tolerance | standard tolerance ± 0.2 mm |
Grating Area Clear Aperture (CA) | 0.5 mm from substrate edge; exception: 125 mm for 130 mm wide gratings |
Substrate Thickness |
0.675 ± 0.050 mm unless stated |
Line Density Uniformity | 0.001 lines/mm |
Wavefront Error | <0.2 λ at operational wavelength over 25 mm |
Surface Quality in CA | 60/40 scratch/dig |
Surface Quality outside of CA | no requirements |
Material | Fused silica substrate, non-organic dielectrics. Contains no polymers. |
For detailed specifications, please see relevant data sheet.